%0 Journal Article
%T Organosiloxane-based bottom antireflective coatings for 193-nm lithography
%A Kennedy, Joseph T.
%J Proceedings of SPIE
%V 5039
%N 1
%P 929-939
%@ 0277-786X
%D 2003-06-11
%I SPIE
%~ DeepDyve