%0 Journal Article
%T Fabrication of 65-nm Holes for 157-nm Lithography
%A Kawaguchi, Etsuro
%A Watanabe, Kunio
%A Kurose, Eiji
%A Furukawa, Takamitsu
%A Itani, Toshiro
%J Japanese Journal of Applied Physics
%V 43
%N 6S
%@ 0021-4922
%D 2004-06-01
%~ DeepDyve