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The thermal surface chemistry of copper(I)- N , N ′-di- sec -butylacetamidinate, (Cu( s Bu-amd)) 2 , a metalorganic complex recently proposed for the chemical-based deposition of copper films, has been characterized on SiO 2 films under ultrahigh vacuum conditions by x-ray photoelectron...
In this study, the authors investigated atomic layer deposition (ALD) of B 2 O 3 and BN for conformal, ultrashallow B doping applications and compared the effect of dopant-containing overlayers on sheet resistance (R s ) and B profiles for both types of films subjected to a drive-in thermal...
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