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We demonstrate the fabrication of polymer microneedle arrays using soft lithography. A photomask was designed to use Fresnel diffraction of UV light to create sharp, tapered hollows in SU-8, a negative photoresist, after development. Polymer microneedles were formed using these SU-8 structures as...
The use of customized illumination modes is part of the pursuit to stretch the applicability of immersion ArF lithography. Indeed, a specific illumination source shape that is optimized for a particular design leads to enhanced imaging results. Recently, freeform illumination has become available...