Microchannel edge formation in laser-ablated polyimideEvstrapov, A. A.;Pozdnyakov, A. O.;Gornyi, S. G.;Yudin, K. V.
doi: 10.1134/1.2001048pmid: N/A
Abstract Microchannels in polyimide (PI) have been produced by means of laser ablation (LA). The obtained results confirm the possibility of using the LA technology for the functional structure formation on PI-based microfluidic chips (MFCs). The shape of the channel edge may depend on the thermal properties of PI. This circumstance makes it possible to optimize the process of MFC fabrication by selecting a proper PI and the corresponding LA regime. Optimization of the other characteristics, such as mechanical properties and planarity of the MFCs, requires additional investigations.
Dynamic features of the photoinduced plasticity kinetics in glassy semiconductorsTrunov, M. L.;Dub, S. N.;Shmegera, R. S.
doi: 10.1134/1.2001051pmid: N/A
Abstract The photoinduced variation of plasticity (photoplastic effect) in glassy semiconductor films was studied for the first time on a nanoscale level using a nanoindentation technique. It is shown that an increase in Young’s modulus and a decrease in the nanohardness for such films in the initial stage of their exposure to light with a wavelength in the vicinity of the fundamental absorption edge is a characteristic feature of the photomechanical response kinetics. The photoplastic after-effect has been observed, whereby the state of film softening (as compared to the initial dark state) is retained for some time after the light switch-off, and the length of this period is dependent on the conditions of exposure.
Effect of the nanographite film thickness on the optical rectification pulseMikheev, G. M.;Zonov, R. G.;Obraztsov, A. N.;Volkov, A. P.;Svirko, Yu. P.
doi: 10.1134/1.2001054pmid: N/A
Abstract The phenomenon of optical rectification during pulsed laser irradiation was studied in nanographite films of various thicknesses obtained by plasmachemical deposition on silicon substrates. The amplitude of the optical rectification pulse (ORP) strongly depends on the film thickness h and reaches a maximum at h ∼ 2.5 μm. At a smaller film thickness, the ORP is accompanied by a photoelectric signal of microsecond duration, which arises in the silicon substrate. For the nanographite films with h > 2.5 μm, the ORP is observed in the absence of any signal from the substrate, which allows such films to be used in fast-response detectors of pulsed laser radiation in a broad spectral range.
Composition profiles of silicon-silicon oxide and silicon-rare earth oxide structuresLatukhina, N. V.;Lebedev, V. M.
doi: 10.1134/1.2001055pmid: N/A
Abstract Elemental composition profiles of the structures comprising the layers of dysprosium oxide (Dy2O3), lutetium oxide (Lu2O3), or silicon oxide (SiO2 with Dy and Lu impurities) on silicon substrates have been studied by means of Rutherford backscattering spectrometry and nuclear reaction analysis. The structures were prepared by high-temperature diffusion in oxygen or air. The results of depth profiling are compared to the concentrations of electrically active impurities in the diffusion layers on silicon, which were determined from measurements of the capacitance-voltage characteristics and the surface resistance and from the data of transmission electron microscopy and X-ray diffraction.
Recombination X-ray radiation from plasma linersOreshkin, V. I.;Baksht, R. B.;Labetskii, A. Yu.;Ratakhin, N. A.;Russkikh, A. G.;Chaikovsky, S. A.;Fedyunin, A. V.;Shishlov, A. V.
doi: 10.1134/1.2001056pmid: N/A
Abstract The possibility of creating a high-power X-ray source based on the recombination radiation mechanism has been studied and analyzed. The recombination X-ray radiation from neon, aluminum, and argon was obtained in experiments with plasma liners performed on the GIT-12 setup using a current pulse amplitude of ∼2.5 MA and a leading pulse front width of ∼300 ns. The obtained results show that the recombination mechanism of X-ray generation offers good prospects for the development of a high-power X-ray source with photon energies in the 7–20-keV range.