High-power broad-band single-mode InGaAsP/InP superluminescent diodePikhtin, N. A.;Il’in, Yu. V.;Leshko, A. Yu.;Lyutetskii, A. V.;Stankevich, A. L.;Tarasov, I. S.;Fetisova, N. V.
doi: 10.1134/1.1262568pmid: N/A
Abstract An InGaAsP/InP separate-confinement double heterostructure having a broad gain profile was used to fabricate superluminescent diodes having high optical power (40 mW), a broad radiation spectrum (65 nm at half-width), and low percent modulation (<1%). Using a cw pump current of 150 mA, 1mW of superluminescence radiation was obtained at the exit from a single-mode optical fiber.
Investigation of profiles of implanted Ti atoms over the depth of boron nitride nanocrystalline ceramic exposed to high radiation doses and fluxes with subsequent annealingDuvanov, S. M.;Baturin, V. A.
doi: 10.1134/1.1262574pmid: N/A
Abstract Results are presented of an investigation of distribution profiles of implanted Ti atoms at high implantation doses (fluence around 1017 cm−2) over the depth of boron nitride (BN) nanocrystalline ceramic. It is observed that the concentration maxima of implanted impurities are shifted into the substrate under post-implantation annealing in vacuum at 950 °C. This behavior of the implanted impurities in BN is directly the opposite of that observed in earlier studies of polycrystalline aluminum oxide ceramic exposed to similar ion thermal treatment. The effective diffusion coefficient of titanium atoms in BN under thermal annealing is estimated. The Ti/O concentration ratio in the layer modified as a result of implantation and subsequent annealing at 950 °C is close to stoichiometric TiO2. A simultaneous increase in the concentration of carbon and nitrogen atoms in the surface layers of BN samples was observed as a result of annealing at 830 and 950 °C.