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Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering
Chi-Tung, Huang; Jenq-Gong, Duh
Follow Journal of Materials Science , Volume 16 (1) Springer Journals – Jan 1, 1997
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- Title
- Microhardness of (Ti,Al)N films deposited by reactive R.F. magnetron sputtering
- Author(s)
- Chi-Tung, Huang; Jenq-Gong, Duh
- Journal
- Follow Journal of Materials Science , Volume 16 (1) Springer Journals – Jan 1, 1997
- Publisher
- Kluwer Academic Publishers
- Copyright
- Copyright © 1997 by Kluwer Academic Publishers
- Subject
- Chemistry; Polymer Sciences; Industrial Chemistry/Chemical Engineering; Characterization and Evaluation Materials; Mechanics
- ISSN
- 0022-2461
- eISSN
- 1573-4811
- D.O.I.
- 10.1023/A:1018548717316
- Publisher site
- Get PDF