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The effects of a thin film dopant precursor on the structure and properties of femtosecond-laser irradiated silicon

Details

Publisher
Springer-Verlag
Copyright
Copyright © 2011 by Springer-Verlag
Subject
Physics; Surfaces and Interfaces, Thin Films; Operating Procedures, Materials Treatment; Characterization and Evaluation of Materials; Optical and Electronic Materials; Nanotechnology; Condensed Matter Physics
ISSN
0947-8396
eISSN
1432-0630
D.O.I.
10.1007/s00339-011-6651-2
Publisher site
See Article on Publisher Site
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