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Study on atomistic model for simulation of anisotropic wet etching

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Title
Study on atomistic model for simulation of anisotropic wet etching
Author(s)
Shayan, Mohsen; Merati, Amir Reza; Arezoo, Behrooz; Rezvankhah, Mohamad Amin
Journal
Journal of Micro/Nanolithography, MEMS and MOEMS , Volume 10 (2) SPIE – Apr 1, 2011
Publisher
SPIE
Copyright
Copyright © 2011 Society of Photo-Optical Instrumentation Engineers (SPIE)
ISSN
1932-5150
eISSN
1932-5134
D.O.I.
10.1117/1.3586798
Publisher site
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