Bookmark

30- nm half-pitch metal patterning using Motif™ critical dimension shrink technique and double patterning

Loading next page...

End of preview. The entire article is 6 pages. Rent the Full Article

 
/lp/spie/30-nm-half-pitch-metal-patterning-using-motif-critical-dimension-xaugyLQwOI
Title
30- nm half-pitch metal patterning using Motif™ critical dimension shrink technique and double patterning
Author(s)
Versluijs, Janko; Brouri, Mohand; Kim, Ji Soo
Journal
Journal of Micro/Nanolithography, MEMS and MOEMS , Volume 8 (1) SPIE – Jan 1, 2009
Publisher
SPIE
Copyright
Copyright © 2009 Society of Photo-Optical Instrumentation Engineers
ISSN
1932-5150
eISSN
1932-5134
D.O.I.
10.1117/1.3066632
Publisher site
Get PDF