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A novel three‐step mesa etching process for semiconductor lasers and the use of Monte Carlo simulations for active‐width control

Chakrabarti, U. K.; Agrawal, G. P.
Journal of Applied Physics , Volume 65 (11) American Institute of PhysicsJun 1, 1989
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Title
A novel three‐step mesa etching process for semiconductor lasers and the use of Monte Carlo simulations for active‐width control
Author(s)
Chakrabarti, U. K.; Agrawal, G. P.
Journal
Journal of Applied Physics , Volume 65 (11) American Institute of Physics – Jun 1, 1989
Publisher
American Institute of Physics
Copyright
Copyright © 1989 American Institute of Physics
ISSN
0021-8979
eISSN
1089-7550
D.O.I.
10.1063/1.343347
Publisher site
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