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Surface corona discharge-induced plasma chemical process-chemical vapor deposition (SPCP-CVD) as a novel method for surface modification of ceramic membranes

Surface corona discharge-induced plasma chemical process-chemical vapor deposition (SPCP-CVD) as... http://www.deepdyve.com/assets/images/DeepDyve-Logo-lg.png Advanced Powder Technology CrossRef

Surface corona discharge-induced plasma chemical process-chemical vapor deposition (SPCP-CVD) as a novel method for surface modification of ceramic membranes

Advanced Powder Technology , Volume 11 (3): 343-351 – Jan 1, 2000

Surface corona discharge-induced plasma chemical process-chemical vapor deposition (SPCP-CVD) as a novel method for surface modification of ceramic membranes

Advanced Powder Technology , Volume 11 (3): 343-351 – Jan 1, 2000

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Publisher
CrossRef
ISSN
0921-8831
DOI
10.1163/156855200750172213
Publisher site
See Article on Publisher Site

Abstract

Journal

Advanced Powder TechnologyCrossRef

Published: Jan 1, 2000

References