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Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films Volume 19 Issue 4

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Effect of temperature on etch rate of iridium and platinum in CF 4 / O 2

Maa, Jer-shen; Ying, Hong; Zhang, Fengyan

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001
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Tungsten silicide for the alternate gate metal in metal-oxide-semiconductor devices

Roh, K.; Youn, S.; Yang, S.; Roh, Y.

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Enhanced passivity of austenitic AISI 304 stainless steel by low-temperature ion nitriding

Rudenja, S.; Pan, J.; Wallinder, I. Odnevall; Leygraf, C.; Kulu, P.; Mikli, V.

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Characterization of residues formed by anhydrous hydrogen fluoride etching of doped oxides

Muscat, Anthony J.; Thorsness, Adam G.; Montaño-Miranda, Gerardo

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The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition

Ito, Natsuko; Moriya, Tsuyoshi; Uesugi, Fumihiko; Moriya, Shuji; Aomori, Masaru; Kato, Yoshinori; Tachibana, Mitsuhiro

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001
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Characteristic structures of the Si (111)-7×7; surface step studied by scanning tunneling microscopy

Miyake, K.; Okawa, S.; Takeuchi, O.; Futaba, D. N.; Hata, K.; Morita, R.; Yamashita, M.; Shigekawa, H.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001
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Reaction kinetics on supported model catalysts: Molecular beam/ in situ time-resolved infrared reflection absorption spectroscopy study of the CO oxidation on alumina supported Pd particles

Libuda, J.; Meusel, I.; Hoffmann, J.; Hartmann, J.; Freund, H.-J.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001
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X-ray photoelectron spectroscopy, x-ray absorption spectroscopy, and x-ray diffraction characterization of CuO –; TiO 2 –; CeO 2 catalyst system

Francisco, M. S. P.; Nascente, P. A. P.; Mastelaro, V. R.; Florentino, A. O.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001
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Controlled coordination and oxidation states of copper and manganese cations in complex nickel–copper–cobalt–manganese oxide thin films;

Kukuruznyak, Dmitry A.; Han, Sang-Wook; Lee, Moon-Hwan; Omland, Kimberly A.; Gregg, Michael C.; Stern, Edward A.; Ohuchi, Fumio S.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001
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Adsorption, decomposition, and stabilization of 1,2-dibromoethane on Cu(111)

Chan, Ally S. Y.; Jones, Robert G.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films Volume 19 Issue 4

Effect of temperature on etch rate of iridium and platinum in CF 4 / O 2

Maa, Jer-shen; Ying, Hong; Zhang, Fengyan

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Tungsten silicide for the alternate gate metal in metal-oxide-semiconductor devices

Roh, K.; Youn, S.; Yang, S.; Roh, Y.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Enhanced passivity of austenitic AISI 304 stainless steel by low-temperature ion nitriding

Rudenja, S.; Pan, J.; Wallinder, I. Odnevall; Leygraf, C.; Kulu, P.; Mikli, V.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Characterization of residues formed by anhydrous hydrogen fluoride etching of doped oxides

Muscat, Anthony J.; Thorsness, Adam G.; Montaño-Miranda, Gerardo

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition

Ito, Natsuko; Moriya, Tsuyoshi; Uesugi, Fumihiko; Moriya, Shuji; Aomori, Masaru; Kato, Yoshinori; Tachibana, Mitsuhiro

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Characteristic structures of the Si (111)-7×7; surface step studied by scanning tunneling microscopy

Miyake, K.; Okawa, S.; Takeuchi, O.; Futaba, D. N.; Hata, K.; Morita, R.; Yamashita, M.; Shigekawa, H.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Reaction kinetics on supported model catalysts: Molecular beam/ in situ time-resolved infrared reflection absorption spectroscopy study of the CO oxidation on alumina supported Pd particles

Libuda, J.; Meusel, I.; Hoffmann, J.; Hartmann, J.; Freund, H.-J.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

X-ray photoelectron spectroscopy, x-ray absorption spectroscopy, and x-ray diffraction characterization of CuO –; TiO 2 –; CeO 2 catalyst system

Francisco, M. S. P.; Nascente, P. A. P.; Mastelaro, V. R.; Florentino, A. O.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Controlled coordination and oxidation states of copper and manganese cations in complex nickel–copper–cobalt–manganese oxide thin films;

Kukuruznyak, Dmitry A.; Han, Sang-Wook; Lee, Moon-Hwan; Omland, Kimberly A.; Gregg, Michael C.; Stern, Edward A.; Ohuchi, Fumio S.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Adsorption, decomposition, and stabilization of 1,2-dibromoethane on Cu(111)

Chan, Ally S. Y.; Jones, Robert G.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

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Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films Volume 19 Issue 4

1 - 10 of 181 articles

Maa, Jer-shen; Ying, Hong; Zhang, Fengyan

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Roh, K.; Youn, S.; Yang, S.; Roh, Y.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Rudenja, S.; Pan, J.; Wallinder, I. Odnevall; Leygraf, C.; Kulu, P.; Mikli, V.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Muscat, Anthony J.; Thorsness, Adam G.; Montaño-Miranda, Gerardo

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Ito, Natsuko; Moriya, Tsuyoshi; Uesugi, Fumihiko; Moriya, Shuji; Aomori, Masaru; Kato, Yoshinori; Tachibana, Mitsuhiro

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Miyake, K.; Okawa, S.; Takeuchi, O.; Futaba, D. N.; Hata, K.; Morita, R.; Yamashita, M.; Shigekawa, H.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Libuda, J.; Meusel, I.; Hoffmann, J.; Hartmann, J.; Freund, H.-J.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Francisco, M. S. P.; Nascente, P. A. P.; Mastelaro, V. R.; Florentino, A. O.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Kukuruznyak, Dmitry A.; Han, Sang-Wook; Lee, Moon-Hwan; Omland, Kimberly A.; Gregg, Michael C.; Stern, Edward A.; Ohuchi, Fumio S.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001

Chan, Ally S. Y.; Jones, Robert G.

Follow Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films , Volume 19 (4) American Vacuum Society – Jul 1, 2001